Alignment apparatus and exposure apparatus using the same
AssigneeCanon Kabushiki Kaisha
InventorNobushige Korenaga
Life of this patent
Estimating the term…
Abstract
An alignment apparatus which generates a driving force between a plate-like movable element and a stator facing the movable element to control alignment of the movable element. The apparatus includes movable element magnets which are arrayed in a plate-like plane of the movable element in accordance with an array cycle and are magnetized in predetermined directions, stator coils which are arrayed at intervals corresponding to the array cycle, and a current controller which supplies control currents having phase differences to each pair of adjacent ones of said stator coils to generate a driving force for driving the movable element between the movable element magnets and the stator coils facing the movable element magnets.
Claims20
An alignment apparatus which generates a driving force between a plate-like movable element and a stator facing the movable element to control alignment of the movable element, said apparatus comprising:
- movable element magnets which are arrayed in a plate-like plane of the movable element in accordance with an array cycle and are magnetized in predetermined directions;
- stator coils which are arrayed at intervals corresponding to the array cycle;
- and
- a current controller which supplies control currents having phase differences to each pair of adjacent ones of said stator coils to generate a driving force for driving the movable element between said movable element magnets and said stator coils facing said movable element magnets.
An exposure apparatus comprising:
- a first movable stage which holds a first wafer and aligns the first wafer at a predetermined position;
- a second movable stage which holds a second wafer and aligns the second wafer at a predetermined position;
- first stator coils for driving in a first direction one of said first and second movable stages located in a measurement region for measuring an exposure result;
- second stator coils for driving the other of said first and second movable stages located in an exposure region for performing exposure in the first direction independently of said movable stage in the measurement region;
- third stator coils for independently driving said first and second movable stages in a second direction perpendicular to the first direction;
- and
- current control means for supplying to said first to third stator coils control currents having phase differences to generate driving forces between movable element magnets of said first and second movable stages and said stator coils facing the movable element magnets.
A device manufacturing method comprising:
- a step of supplying a photosensitive agent to a substrate;
- a step of exposing the substrate by an exposure apparatus;
- and
- a step of developing the substrate,
- wherein the exposure apparatus has
- a first movable stage which holds a first wafer and aligns the first wafer at a predetermined position,
- a second movable stage which holds a second wafer and aligns the second wafer at a predetermined position,
- a first stator coil for driving in a first direction one of the first and second movable stages located in a measurement region for measuring an exposure result,
- a second stator coil for driving the other of the first and second movable stages located in an exposure region for performing exposure in the first direction independently of the movable stage in the measurement region,
- a third stator coil for independently driving the first and second movable stages in a second direction perpendicular to the first direction, and
- current control means for supplying to the first to third stator coils control currents having phase differences to generate driving forces between movable element magnets of the first and second movable stages and the stator coils facing the movable element magnets.
Dependencies are inferred from the claim text.