Field effect transistor, electrical device array and method for manufacturing those
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsNorishige Nanai, Takayuki Takeuchi
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AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsNorishige Nanai, Takayuki Takeuchi
Estimating the term…
A field effect transistor of the present invention includes: a gate electrode formed on a substrate; a gate insulation layer formed on the gate electrode: a source electrode and a drain electrode that are formed on the gate insulation layer; a n-type semiconductor layer including carbon nanotube, formed between the source electrode and the drain electrode so as to contact with the source electrode and the drain electrode; and a n-type modifying polymer layer formed on the n-type semiconductor layer, the n-type modifying polymer layer being for converting a polarity of the carbon nanotube from an original polarity of p-type into n-type and for stabilizing the polarity. The semiconductor characteristics of CNT are converted concurrently with the formation of the semiconductor protective layer, whereby the manufacturing process can be simplified. Thereby, a CNT-FET circuit that is stable even in the air can be provided.
A field effect transistor, comprising:
An electrical element array, comprising:
A method for manufacturing a field effect transistor, comprising the steps of:
A method for manufacturing an electrical element array including a n-type field effect transistor and a p-type field effect transistor on a substrate, comprising the steps of:
Dependencies are inferred from the claim text.