Micromachining process, system and product
AssigneeHaute Ecole Arc Ne-Be-Ju
InventorsSamuel Jaccard, Serguei Mikhailov, Frans Munnik
Life of this patent
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Abstract
Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy and the irradiation parameters a structure can be created in the bulk of the material leaving the surface essentially untouched.
Claims26
Process for creating a predetermined three-dimensional structure in the bulk of a radiation-sensitive material (40) comprising the steps of:
- directing a beam (818) of penetrating radiation to said radiation-sensitive material,
- providing a mask (810) introducing a space-variable energy loss, in said beam (818),
- deposing energy by said beam (818) locally into said bulk of said material (40) according to a predetermined three-dimensional pattern (612).
Process according to the previous claim, wherein said radiation beam comprises charged ions.
Process according to the previous claim, wherein said charged ions belong to one of the following species:
- H;
- He;
- Li;
- Be;
- B;
- C;
- N;
- O.
Process according to the previous claim, wherein the energy loss in the mask (810) varies in such a way that the energy is deposited in the bulk of the material (40) according to a 3D structure.
Miniaturized device comprising a three-dimensional structure realizable by the process of one of the preceding claims.
Device according to the preceding claim, comprising at least one internal channel for micro- or nano-fluidic applications and/or for micro- or nano-gas flow applications.
Process for creating a predetermined three-dimensional structure in the bulk of a photoresist material, comprising the steps of:
- directing a beam (818) of penetrating radiation to said photoresist material,
- providing a mask (810) introducing a space-variable energy loss, in said beam (818),
- deposing energy by said beam (818) locally into said bulk of said material according to a predetermined three-dimensional pattern.
Process according to the previous claim, wherein said photoresist material is a negative photoresist material, and further comprising a step of developing said negative photoresist material for obtaining a three-dimensional micro-structure corresponding to the three-dimensional pattern of energy deposited in the photoresist material.
Process for creating a predetermined structure in a diamond substrate, the process comprising the steps of:
- directing a beam (818) of radiation to said diamond substrate,
- deposing energy by said beam (818) locally into said diamond substrate, according to a predetermined pattern,
- selectively removing those parts of the diamond substrate in which said energy has been deposited.
Dependencies are inferred from the claim text.