Removal of contaminants from a fluid
AssigneeTokyo Electron Limited
InventorsRonald Bertram, Douglas Scott
Life of this patent
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Abstract
A method and apparatus for removing contaminants from a fluid are disclosed. The fluid is introduced into a decontamination chamber such that the fluid is cooled and contaminants fall out within the decontamination chamber, producing a purified fluid. The purified fluid is then retrieved and can be used in a supercritical processing system.
Claims36
A decontamination system for providing a purified temperature controlled fluid, comprising:
- a first filter element;
- a first flow control element coupled to the first filter element;
- a decontamination module coupled to the first flow control element;
- a bypass element coupled to the first flow control element
- a second flow control element coupled to the decontamination module and coupled to the bypass element;
- a second filter element coupled to the second flow control element;
- and
- a controller coupled to the first filter element, coupled to the first flow control element, coupled to the decontamination module, coupled to the second flow control element, coupled to the second filter element, wherein the controller comprises means for determining a contaminant level for a first fluid entering the decontamination system;
- means for comparing the contaminant level to a threshold value, means for diverting the first fluid to the decontamination module when the contaminant level is greater than the threshold value;
- and means for diverting the first fluid to the bypass element when the contaminant level is less than or equal to the threshold value.
A supercritical processing system comprising:
- a supercritical processing chamber;
- a recirculation system coupled to the supercritical processing chamber, wherein the supercritical processing chamber and the recirculation system form a recirculation loop;
- and
- a decontamination system coupled to the supercritical processing chamber, wherein the decontamination system comprises means for pressurizing the recirculation loop using the temperature controlled purified fluid.
A method of operating a decontamination system comprising:
- supplying a first quantity of fluid at a first temperature to the decontamination system;
- determining a contaminant level for the first quantity of fluid;
- and selectively performing one of a decontamination process when the contaminant level is above a threshold value and a bypass process when the contaminant level is equal to or below the threshold value.
A method of operating a processing system comprising a recirculation loop including a processing chamber and a recirculation system, and a decontamination system coupled to the recirculation loop, the method comprising:
- positioning a substrate on a substrate holder in the processing chamber;
- sealing the processing chamber;
- pressurizing the recirculation loop to a supercritical pressure, wherein the decontamination system pressurizes the recirculation loop using a first volume of temperature controlled purified fluid;
- processing the substrate using a supercritical substrate cleaning process;
- performing a push-through process, wherein the decontamination system provides a second volume of temperature controlled purified fluid during a push-through process, the second volume being larger than the volume of the recirculation loop;
- performing a pressure cycling process, wherein the decontamination system provides a third volume of temperature controlled purified fluid during a first portion of the pressure cycling process and provides a fourth volume of temperature controlled purified fluid during a second portion of the pressure cycling process, the third volume and the fourth volume being larger than the volume of the recirculation loop, and wherein the temperature differential within the third volume of temperature controlled fluid being less than approximately 10 degrees Celsius, and the temperature differential within the fourth volume of temperature controlled fluid being less than approximately 10 degrees Celsius;
- performing a chamber venting process;
- and
- removing the substrate.
Dependencies are inferred from the claim text.