Temperature control method and apparatus, and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsMasao Furuya, Koji Ando
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AssigneeTokyo Electron Limited
InventorsMasao Furuya, Koji Ando
Estimating the term…
A temperature control method and apparatus, and a plasma processing apparatus are provided. The temperature control method includes the steps of, during an idle state in which a substrate processing is not performed, controlling a temperature of a heat transfer medium in a circulation channel by a second heat exchanger and a heater to control a temperature of an electrode to be maintained at a predetermined set temperature, and when a high frequency power is applied to the electrode to start the substrate processing, reducing the temperature of the heat transfer medium below the set temperature of the electrode through the use of a first heat exchanger and the second heat exchanger to maintain the temperature of the electrode at the set temperature.
A temperature control method of an electrode, to which a high frequency power for generating a plasma in a plasma processing apparatus is applied, wherein the temperature control method is carried out by using a temperature control apparatus including:
A temperature control apparatus of an electrode, to which a high frequency power for generating a plasma in a plasma processing apparatus is applied, comprising:
A plasma processing apparatus comprising:
Dependencies are inferred from the claim text.