Method and apparatus for forming a photonic crystal
AssigneeHewlett-Packard Development Company, L.P.
InventorsJong-Souk Yeo, Henry Lewis
Life of this patent
Estimating the term…
Abstract
Embodiments of methods, apparatuses, devices, or systems for forming a photonic crystal are described.
Claims38
A photonic crystal, comprising:
- a material with a plurality of lithographically defined periodic features formed therein, at least a portion of the periodic features comprising internal surfaces;
- and
- one or more thin films deposited on a substantial portion of the features, wherein at least a portion of the one or more thin films is deposited on the internal surfaces to a substantially uniform thickness.
A method, comprising:
- selectively removing one or more portions of a material by use of one or more holographic exposure processes and one or more developing processes to form a plurality of features, at least a portion of the plurality of features comprising internal surfaces defining a lattice arrangement of voids;
- depositing one or more thin films on at least a portion of the features by use of one or more deposition processes to form at least a portion of a photonic device.
(canceled)
22-29. (canceled)
A method of manufacturing a photonic crystal, comprising:
- a step for selectively removing one or more portions of a photosensitive material by use of one or more holographic lithography processes to form one or more features of the photonic crystal;
- a step for depositing one or more thin films on at least a portion of the one or more features by use of one or more atomic layer deposition processes.
The method of claim 45, wherein the holographic lithography process utilizes a laser source substantially comprising a solid state laser, a gas laser, or a semiconductor laser.
The method of claim 45, wherein the one or more features comprise voids formed in a lattice arrangement.
The method of claim 45, wherein photosensitive material comprises one or more of:
- photosensitive polymer materials and photosensitive epoxy materials.
The method of claim 45, wherein at least a portion of the one or more thin films comprise monolayers, submonolayers, or multilayers.
The method of claim 45, wherein at least a portion of the one or more thin films comprises atomic or subatomic layers of material.
The method of claim 45, wherein at least a portion of the one or more thin films comprise one or more of:
- metals, metal oxides, metal nitrides, II-VI compounds, III-IV compounds including GaAs, InP, InAs, ZnS, CdS, CdTe, W, W2N, TaN, Ta2O5, TiO2, or combinations thereof.
The method of claim 45, wherein the photosensitive material substantially comprises SU8, and a plurality of thin films are formed, wherein the plurality of thin films substantially comprise W, formed to a substantially uniform thickness within the range of 2-5 Angstroms.
A photonic crystal, formed substantially by a process comprising:
- forming a first material on a substrate;
- removing at least a portion of the first material from the substrate, by use of one or more holographic lithography processes, to form a three dimensional crystal structure having internal surfaces;
- depositing a second material on at least a portion of the internal surfaces by use of one or more atomic layer deposition (ALD) processes;
- and
- repeating the depositing step such as to form a plurality of thin films on at least a portion of the internal surfaces.
A method of making a photonic crystal, comprising the steps of:
- a) providing a substrate,
- b) forming a first material on the substrate,
- c) removing at least a portion of the first material from the substrate by use of one or more holographic lithography processes to form a three dimensional crystal structure having internal surfaces,
- d) depositing a second material on at least a portion of the internal surfaces by use of one or more atomic layer deposition processes, and
- e) repeating the depositing step to form a plurality of thin films on at least a portion of the internal surfaces.
Dependencies are inferred from the claim text.