Semiconductor substrate processing method and apparatus

A computer readable medium having a set of instructions stored thereon, which when executed by a processor, cause a method to be performed, the method comprising:

• providing a semiconductor substrate having a surface and a plurality of features on the surface, each feature being positioned on the surface at a first respective point in a first coordinate system;
• plotting the position of each feature at a second respective point in a second coordinate system;
• and
• generating a translation between the first and the second coordinate systems.

A semiconductor substrate processing system comprising:

• a frame;
• a chamber wall enclosing a chamber, the chamber having a first portion and a second portion;
• a load-lock chamber connected to the frame and being adjacent to the first portion of the chamber;
• a robotic stage having a base and a robotic arm, the base being connected to the frame and positioned within the first portion of the chamber, the robotic arm being rotatably connected to the base to transport a semiconductor substrate from the load-lock chamber to the second portion of the chamber into a test position;
• an electromagnetic radiation source connected to the frame to emit electromagnetic radiation onto the semiconductor wafer, the electromagnetic radiation causing photoelectrons to be emitted from a material on the semiconductor substrate;
• an analyzer connected to the frame to capture the photoelectrons and determine the kinetic energy of the photoelectrons;
• and
• a controller being electrically connected to and to control the robotic stage, the electromagnetic radiation source, and the analyzer.