Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model

A computer-readable storage medium storing instructions that when executed by a computer cause the computer to perform a method for identifying a problem edge in an uncorrected or corrected mask layout which is likely to have manufacturing problems, the method comprising:

• creating an on-target process model that models a semiconductor manufacturing process under nominal process conditions;
• creating one or more off-target process models that model the semiconductor manufacturing process under one or more process conditions that are different from nominal process conditions;
• computing a process-sensitivity model using the on-target process model and the one or more off-target process models, wherein the process-sensitivity model can be represented by a multidimensional function that captures process-sensitivity information;
• computing an edge-detecting process-sensitivity model by convolving the process-sensitivity model with an edge-detecting function which can be used to detect edges in an image;
• and
• identifying a problem edge using the edge-detecting process-sensitivity model.

A method for highlighting a manufacturing problem edge in an image of an uncorrected or corrected mask layout using an edge-detecting process-sensitivity model, the method comprising:

• computing a problem-indicator by convolving a first multidimensional function that represents the edge-detecting process-sensitivity model with a second multidimensional function that represents the mask layout;
• identifying a manufacturing problem edge in the mask layout by comparing the problem-indicator with a threshold;
• and
• highlighting the manufacturing problem edge by modifying the image in the proximity of the identified manufacturing problem edge.