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US 2006/0190911 A1Published application
Translation generation for a mask pattern
AssigneeIntel Corporation
InventorAlan Stivers
Life of this patent
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Abstract
Generation of one or more translations is described. The generated translations may be applied to a mask pattern so that the pattern may be moved to cover one or more mask defects in part or in totality.
Claims30
A method, comprising:
- receiving by a computing environment, a first mask defect location;
- and
- generating in the computing environment, if possible, a first translation, the generating being based at least in part on said first mask defect location, and the first translation when applied to a pattern results in a first portion of the pattern covering the first defect in part or in totality.
An article of manufacture, comprising:
- a recordable medium;
- and
- a plurality of machine readable programming instructions recorded on said recordable medium, with the programming instructions designed to enable a computing apparatus to:
- receive a first mask defect location;
- and
- generate a first translation based at least in part on said first mask defect location, the first translation when applied to a pattern results in a first portion of the pattern covering the first defect in part or in totality.
3 more elements
An apparatus, comprising:
- a storage medium having stored therein a plurality of programming instructions designed to implement a pattern planner, including capabilities to receive a first mask defect location;
- and generate a first translation based at least in part on said first mask defect location, the first translation when applied to a pattern results in a first portion of the pattern covering the first defect in part or in totality;
- and
- at least one processor coupled to the storage medium to execute the programming instructions.
1 more element
Dependencies are inferred from the claim text.