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US 2006/0189155 A1Published application
Method of Forming Semiconductor Compound Film For Fabrication of Electronic Device and Film Produced by Same
OwnerBulent Basolinventor
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Abstract
A process of forming a compound film includes formulating a nano-powder material with a controlled overall composition and including particles of one solid solution The nano-powder material is deposited on a substrate to form a layer on the substrate, and the layer is reacted in at least one suitable atmosphere to form the compound film. The compound film may be used in fabrication of a radiation detector or solar cell.
Claims26
A powder material for use in preparing a compound film on a substrate comprising particles of a copper-gallium solid solution which are submicronic in size.
Dependencies are inferred from the claim text.