Advance ridge structure for microlens gapless approach
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJack Deng, Chin Kuo, Fu-Tien Weng, Chih-Kung Chang, Bii-Junq Chang
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Abstract
A method of manufacturing a plurality of microlenses on a substrate comprises forming a grid having raised ridges defining a plurality of openings on the substrate and forming a plurality of patterned photoresist features each disposed within one of the plurality of openings. The plurality of patterned photoresist features can then be reflowed inside the grid.
Claims26
A method of manufacturing a plurality of microlenses on a substrate, comprising:
- forming a grid having raised ridges defining a plurality of openings on the substrate;
- forming a plurality of patterned features disposed within the plurality of openings;
- and
- reflowing the plurality of patterned features to form the plurality of microlenses.
A method of manufacturing a plurality of microlenses on a substrate having a plurality of photo sensors disposed therein, comprising:
- forming a first photoresist layer having a predefined pattern on the substrate;
- partially etching the substrate to form a grid having raised ridges defining a plurality of openings on the substrate;
- removing the first photoresist layer after partially etching the substrate;
- forming a plurality of patterned photoresist features each located within one of the plurality of openings;
- and
- reflowing the plurality of patterned photoresist features.
A method of manufacturing a plurality of microlenses on a substrate having a plurality of photo sensors disposed therein, comprising:
- forming a dielectric layer over a color filter layer disposed in the substrate;
- forming a photoresist layer having a predefined pattern on the dielectric layer;
- partially etching the dielectric layer to form a grid having raised ridges defining a plurality of openings on the substrate;
- removing the photoresist layer after partially etching the substrate;
- forming a plurality of patterned photoresist features each located within one of the plurality of openings;
- and
- reflowing the plurality of patterned photoresist features.
A microlens device disposed on a substrate having a photo sensor located therein, comprising:
- a grid having raised ridges defining a opening on the substrate;
- and
- a patterned photoresist feature having a curved surface and being disposed within the opening.
Dependencies are inferred from the claim text.