Method of fabricating semiconductor optical device

A method of fabricating a semiconductor optical device, comprising:

• after forming a buffer layer, an active layer and a passivation layer on a substrate, forming a plurality of first patterns having a stripe shape on a passivation layer;
• patterning the passivation layer, the active layer and the buffer layer using the first patterns as masks;
• forming a clad layer and an ohmic contact layer on an entire surface of the resultant structure, after removing the first pattern;
• forming a plurality of second patterns having a stripe shape on the ohmic contact layer of an optical amplifier region and a laser diode region, respectively;
• forming a current blocking layer on the ohmic contact layer and the clad layer of a portion exposed through an ion injection process using the second patterns as masks;
• removing the ohmic contact layer of a portion, in which ions are injected, after removing the second patterns, and forming an oxide pattern to expose the ohmic contact layer of a portion, in which ions are not injected;
• forming first metal electrodes on the exposed ohmic contact layer of the optical amplifier region and the laser diode region, respectively;
• and
• forming a second metal electrode on a bottom surface of the substrate.