Photosensitive resin composition and method of forming a pattern using the composition

A photosensitive resin composition comprising:

• a multi-functional bisphenol A novolak epoxy resin, a functionality of which is 5-functional groups or more and represented by general formula (3) shown below:
• (in the formula, R1 to R6 are independently H or CH3, respectively, n indicates zero or larger integer);
• and
• a cation polymerization initiator represented by general formula (1) shown below:
• (in the formula, X1 and X2 indicate a hydrogen atom, a halogen atom, a hydrocarbon group which may contain an oxygen atom or a halogen atom, or an alkoxy group to which a substituent may bond, respectively, and they may be identical to or different from one another, and Y indicates a hydrogen atom, a halogen atom, a hydrocarbon group which may contain an oxygen atom or a halogen atom, or an alkoxy group to which a substituent may bond).

A photosensitive resin composition laminate comprising:

• a photosensitive resin composition layer obtained from the photosensitive resin composition according to clam 9;
• and
• a protective film,
• wherein at least one side of the photosensitive resin composition layer is protected with the protective film.