Norbornene polymer for photoresist and photoresist composition comprising the same

A norbomene copolymer for a photoresist having Formula 2 below:

• wherein R1 to R4, and R6 are each independently H, F, hydroxyl, or a C1-C30 linear or cyclic alkyl, hydroxyalkyl, alkoxy, epoxy, alkoxyalkyl, ester or polycyclic group which is dissociated or not dissociated by acids;
• R5 is a substituted or unsubstituted C1-C30 linear or cyclic alkyl or polycyclic group which contains an epoxy group;
• r, s, t and u independently satsfy the relations of r+s+t+u=1, 0<r<1, 0≦s <1, 0≦t<1 and 0<u<1;and
• q is an integer between 0 to 2.

A photoresist composition comprising a norbomene copolymer, an acid generator and an organic solvent, wherein the norbomene copolymer has a formula selected from Formula 1 or Formula 2 below:

• wherein R1 to R4, and R6 are each independently H, F, hydroxyl, or a C1-C30 linear or cyclic alkyl, hydroxyalkyl, alkoxy, epoxy, alkoxyalkyl, ester or polycyclic group which is dissociated or not dissociated by acids;
• R5 is a substituted or unsubstituted C1-C30 linear or cyclic alkyl or polycyclic group which contains an epoxy group;
• l, m, n, o and p independently satisfy the relations of l+m+n+o+p=1, 0<l <1, 0<m<1,0≦n<1, 0≦o<1 and 0≦p<1;
• and
• q is an integer between 0 to 2,
• wherein R1 to R4, and R6 are each independently H, F, hydroxyl, or a C1-C30 linear or cyclic alkyl, hydroxyalkyl, alkoxy, epoxy, alkoxyalkyl, ester or polycyclic group which is dissociated or not dissociated by acids;
• R5 is a substituted or unsubstituted C1-C30 linear or cyclic alkyl or polycyclic group which contains an epoxy group;
• r, s, t and u independently satisfy the relations of r+s+t+u=1, 0<r<1, 0≦s <1, 0≦t<1 and 0<u<1;
• and
• q is an integer between 0 to 2.