Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus
AssigneeSeiko Epson Corporation
InventorsToshimitsu Hirai, Katsuyuki Moriya
Life of this patent
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Abstract
A method of forming a film pattern by arranging a functional liquid on a substrate includes; forming first banks having a lyophobic property on surfaces thereof; arranging a first functional liquid in regions partitioned by the first banks; baking the first functional liquid; forming second banks on the first banks; and arranging a second functional liquid in regions partitioned by the second banks. A lyophilic treatment is performed on the surfaces of the first banks between the arranging of the first functional liquid and the forming of the second banks.
Claims8
A method of forming a film pattern by arranging a functional liquid on a substrate, comprising:
- forming first banks having a lyophobic property on surfaces thereof;
- arranging a first functional liquid in regions partitioned by the first banks;
- baking the first functional liquid;
- forming second banks on the first banks;
- and
- arranging a second functional liquid in regions partitioned by the second banks,
- wherein a lyophilic treatment is performed on the surfaces of the first banks between the arranging of the first functional liquid and the forming of the second banks.
Dependencies are inferred from the claim text.