Substrate processing apparatus and substrate processing method

A substrate processing equipment comprising

• heating means that heats a substrate accommodated in a processing chamber,
• first temperature detection means that detects temperature in the neighborhood of the heating means,
• second temperature detection means that detects temperature in the neighborhood of the substrate, and
• control means that mixes a first predicted temperature of the substrate calculated from the temperature detected by the first temperature detection means and a second predicted temperature of the substrate calculated from the temperature detected by the second temperature detection means to control the heating means with the use of the predicted temperature as mixed.

A substrate processing method comprising the steps of:

• heating a substrate accommodated in a processing chamber,
• detecting a temperature in the processing chamber,
• predicting a temperature of the substrate periodically, and
• mixing the detected temperature in the processing chamber and a predicted temperature, which is predicted periodically in the previous period, to predict a temperature in a period subsequent to the previous period to control heating of the substrate with the use of the predicted temperature.

A substrate processing method for a substrate processing equipment comprising a reaction chamber that processes a substrate, heating means that heats an interior of the reaction chamber, control means that controls the heating means, first temperature detection means that detects temperature between the heating means and the substrate, and second temperature detection means that detects temperature nearer to the substrate than the first temperature detection means, the method comprising the steps of:

• measuring a temperature with the first temperature detection means,
• calculating a first substrate predicted temperature from the temperature measured by the first temperature detection means,
• measuring a temperature with the second temperature detection means,
• calculating a second substrate predicted temperature from the temperature measured by the second temperature detection means, and
• mixing the first substrate predicted temperature and the second substrate predicted temperature to control the heating means.