Material analysis using multiple x-ray reflectometry models
AssigneeJordan Valley Applied Radiation Ltd.
InventorsDileep Agnihotri, Alex Dikopoltsev, Boris Yokhin
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Abstract
A method for inspection of a sample includes irradiating the sample with a beam of X-rays, measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum, and applying a multi-step analysis to the spectrum so as to determine one or more physical properties of a simulated model of the sample. The multi-step analysis includes spectrally analyzing the spectrum so as to determine one or more characteristic frequencies and fitting the simulated model to the spectrum by an iterative optimization process beginning from an initial condition determined by the one or more characteristic frequencies.
Claims30
A method for inspection of a sample, comprising:
- irradiating the sample with a beam of X-rays;
- measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum;
- and applying a multi-step analysis to the spectrum so as to determine one or more physical properties of a simulated model of the sample, the analysis comprising:
- spectrally analyzing the spectrum so as to determine one or more characteristic frequencies;
- and
- fitting the simulated model to the spectrum by an iterative optimization process beginning from an initial condition determined by the one or more characteristic frequencies.
A method for inspection of a sample, comprising:
- irradiating the sample with a beam of X-rays;
- measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum;
- and
- applying a multi-step analysis to the spectrum so as to determine one or more physical properties of simulated models of the sample, the analysis comprising:
- fitting the simulated model to the spectrum by two or more iterative optimization processes so as to generate respective fitting results;
- and
- comparing the results of the two or more iterative optimization processes to one another so as to determine an output model of the multi-step analysis.
Apparatus for inspection of a sample, comprising:
- an X-ray source, which is arranged to irradiate the sample with a beam of X-rays;
- a detector assembly, which is arranged to measure a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum;
- and
- a processor, which is arranged to spectrally analyze the spectrum so as to determine one or more characteristic frequencies, and to fit a simulated model to the spectrum by an iterative optimization process beginning from an initial condition determined by the one or more characteristic frequencies, thereby determining one or more physical properties of the simulated model of the sample.
Apparatus for inspection of a sample, comprising:
- an X-ray source, which is arranged to irradiate the sample with a beam of X-rays;
- a detector assembly, which is arranged to measure a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum;
- and
- a processor, which is arranged to fit a simulated model to the spectrum by two or more iterative optimization processes so as to generate respective fitting results and to compare the results of the two or more iterative optimization processes to one another, thereby determining one or more physical properties of the simulated model of the sample.
Dependencies are inferred from the claim text.