Method for forming coatings on structural components with corrosion-mitigating materials

A method for mitigating corrosion cracking on a structural component, said method comprising:

• depositing a metallic material on said structural component to form a coating thereon, said depositing being carried out by a method selected from the group consisting of chemical vapor deposition and physical vapor deposition;
• and
• converting at least an outer layer of said coating to an electrically insulating material that is capable of mitigating corrosion cracking;
• wherein the electrochemical potential (“ECP”) of said structural component coated with said coating is less than about −0.23 VSHE based on a standard hydrogen electrode scale, after said electrically insulating material has been formed on said coating.

A method for mitigating corrosion cracking on a structural component, said method comprising:

• depositing a metallic material on said structural component to form a coating thereon, said depositing being carried out by a method selected from the group consisting of chemical vapor deposition and physical vapor deposition;
• and
• converting at least an outer layer of said coating to an electrically insulating material that is capable of mitigating corrosion cracking;
• wherein the electrochemical potential (“ECP”) of said structural component coated with said coating is less than about −0.3 VSHE based on a standard hydrogen electrode scale, after said electrically insulating material has been formed on said coating.

A method for mitigating corrosion cracking on a structural component, said method comprising:

• depositing a metallic material on said structural component to form a coating thereon, said depositing being carried out by a method selected from the group consisting of chemical vapor deposition and physical vapor deposition;
• and
• converting at least an outer layer of said coating to an electrically insulating material that is capable of mitigating corrosion cracking;
• wherein said metallic material is selected from the group consisting of aluminum, chromium, silicon, scandium, yttrium, lanthanum, titanium, zirconium, hafnium, vanadium, niobium, tantalum, cerium, and alloys thereof.