Pattern generator diffractive mirror methods and systems

A method for creating a microlithographic pattern on a workpiece sensitive to radiation using a spatial light modulator having a multitude of modulating elements, the modulating elements having a piston action, including:

• reading from an information storage device a digital pattern description,
• extracting from the pattern description a sequence of partial patterns,
• converting said partial patterns to modulator signals,
• modulating groups of the piston elements to positions corresponding to an on-state, an off-state and at least one intermediate value,
• emitting electromagnetic radiation in the wavelength range from extreme ultraviolet (EUV) to infrared (IR),
• illuminating by said radiation the spatial light modulator,
• projecting the illumination from of the spatial light modulator onto the workpiece forming a partial image, and
• moving said workpiece and/or projection system relative to each other, coordinating the movement of the workpiece, the modulate groups of piston elements and intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns.

A method for creating a microlithographic pattern on a workpiece sensitive to radiation using a spatial light modulator having a multitude of modulating elements, the modulating elements having a piston action, comprising the steps of:

• reading from an information storage device a pattern description,
• extracting from the pattern description a sequence of partial patterns,
• converting said partial patterns to modulator signals,
• modulating groups of the piston elements to positions that produce real amplitude values of −1 to 0 to +1,
• emitting electromagnetic radiation in the wavelength range from extreme ultraviolet (EUV) to infrared (IR),
• illuminating by said radiation the spatial light modulator,
• projecting the illumination from of the spatial light modulator onto the workpiece forming a partial image, and
• moving said workpiece and/or projection system relative to each other, coordinating the movement of the workpiece, the modulate groups of piston elements and intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns.

A method of translating an edge placement value to a mirror modulation signal to produced in a microlithographic pattern on a workpiece sensitive to radiation using a spatial light modulator having a multitude of modulating elements, including:

• reading from an information storage device a pattern description,
• extracting from the pattern description a sequence of partial patterns,
• converting said partial patterns to modulating signals, including
• calculating a desired edge placement in an area of the partial pattern and
• applying a non-linear transfer function that translates the desired edge placement value into a modulating signal,
• modulating the elements using the modulating signal to positions that produce the partial patterns,
• emitting electromagnetic radiation in the wavelength range from extreme ultraviolet (EUV) to infrared (IR),
• illuminating by said radiation the spatial light modulator,
• projecting the illumination from of the spatial light modulator onto the workpiece forming a partial image, and
• moving said workpiece and/or projection system relative to each other, coordinating the movement of the workpiece, the modulate groups of piston elements and intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns.

A method for creating a microlithographic pattern on a workpiece sensitive to radiation using a spatial light modulator having a multitude of modulating element groups, including:

• reading from an information storage device a digital pattern description,
• extracting from the pattern description a sequence of partial patterns,
• converting said partial patterns to modulator signals,
• actuating a piston motion of at least one element in a group of the elements using the modulator signal to select among at least an on-state and an off-state, differentiated by diffractive effects among adjoining elements,
• emitting electromagnetic radiation in the wavelength range from extreme ultraviolet (EUV) to infrared (IR),
• illuminating by said radiation the spatial light modulator,
• projecting the illumination from of the spatial light modulator onto the workpiece forming a partial image, and
• moving said workpiece and/or projection system relative to each other, coordinating the movement of the workpiece, the modulate groups of piston elements and intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns.