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US 2006/0187440 A1Published application
Apparatus and method for mounting a hard pellicle
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorBurn Jeng Lin
Life of this patent
Estimating the term…
Abstract
An apparatus for mounting at least one hard pellicle to a mask which includes an enclosure having an interior cavity, demounting means for removing a protective cover from a mask, mounting means for mounting at least one hard pellicle to the mask and conduit means for pumping a light-transmitting gas into the interior cavity between the hard pellicle and the mask.
Claims6
1-20. (canceled)
A method for imaging wafers using a projection mask aligner comprising the steps of:
- providing a projection mask aligner equipped with a hard pellicle mounting apparatus, said hard pellicle mounting apparatus further comprises an enclosure comprising an interior cavity sufficiently large to accommodate a mask, and inlet port for receiving a mask with a protective cover mounted thereon, and an outlet port for outputting a mask covered by at least one hard pellicle;
- demounting means for removing said protective cover from said mask;
- mounting means for mounting said at least one hard pellicle on said mask forming a hard pellicle/mask assembly;
- and conduit means for receiving a light-transmitting gas;
- forming a hard pellicle/mask assembly having at least one hard pellicle mounted thereon;
- positioning said hard pellicle/mask assembly in-between a light source and an imaging lens;
- positioning a photoresist coated semiconductor wafer under said imaging lens with a photoresist layer facing said lens;
- and
- imaging microelectronics circuits on said hard pellicle/mask assembly onto said semiconductor wafer.
6 more elements
Dependencies are inferred from the claim text.