Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorKeiji Emoto
Life of this patent
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Abstract
An exposure apparatus including an illumination optical unit for irradiating exposure light, a stage for mounting a substrate and moving the substrate, a driving unit for driving the stage, a heater for applying heat to the stage, and a heat generation amount control unit for controlling heat generation amount to suppress a temperature change of the stage before or after driving of the driving unit or a temperature change of the stage before or after irradiating of the illumination optical unit.
Claims15
1-48. (canceled)
An exposure apparatus comprising:
- an illumination optical unit for irradiating exposure light;
- a stage for mounting a substrate and moving the substrate;
- a driving unit for driving said stage;
- a heater for applying heat to said stage;
- and
- a heat generation amount control unit for controlling heat generation amount to suppress a temperature change of said stage before or after driving of said driving unit or a temperature change of said stage before or after irradiating of said illumination optical unit.
An exposure apparatus comprising:
- an illumination optical unit for irradiating exposure light;
- an exposure light amount control unit for controlling exposure light amount of the exposure light irradiated by said illumination optical unit;
- a stage for mounting a substrate and moving the substrate;
- a linear motor for driving said stage by switching a coil used for driving among a plurality of coils;
- and
- a control unit for energizing coils which are not used for driving among the plurality of coils.
An exposure apparatus comprising:
- a stage for mounting a substrate and moving the substrate;
- a linear motor for driving said stage by switching a coil used for driving among a plurality of coils;
- a stage driving control unit for controlling driving of said stage;
- and
- a control unit for energizing coils which are not used for driving among the plurality of coils based on a signal from said stage driving control unit.
An exposure apparatus comprising:
- a stage for mounting a substrate and moving the substrate;
- a linear motor for driving said stage by switching a coil used for driving among a plurality of coils;
- a temperature sensor which is disposed on said stage;
- and
- a control unit for energizing coils which are not used for driving among the plurality of coils based on a signal from said temperature sensor.
An exposure apparatus comprising:
- a stage;
- a linear motor for driving said stage;
- a heat generation unit disposed on said stage;
- and
- a heat generation amount control unit for controlling heat generation amount generated by said heat generation unit,
- wherein said heat generation amount control unit controls said heat generation unit so that heat generation amount of said heat generation unit is reduced in accordance with increasing of an energization amount of coils of said linear motor.
Dependencies are inferred from the claim text.