Exposure apparatus, exposure method, and method for producing device

An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• a substrate stage which has a substrate holder for holding the substrate and which is movable while holding the substrate on the substrate holder;
• a first detecting system which detects an alignment mark on the substrate held by the substrate stage;
• and
• a second detecting system which detects a reference provided on the substrate stage through the liquid, wherein:
• the substrate or a dummy substrate is arranged on the substrate holder when the reference provided on the substrate stage is detected through the liquid by using the second detecting system.

An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• a reference member which has an upper surface having no difference in level;
• and
• a detecting system which detects a reference formed on the reference member in a state in which a space between an end surface of the projection optical system and the upper surface of the reference member is filled with the liquid.

An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• a substrate stage which has a substrate holder for holding the substrate and which is movable while holding the substrate on the substrate holder;
• a detector which detects whether or not the substrate or a dummy substrate is held by the substrate holder;
• and
• a control unit which changes a movable area of the substrate stage depending on a detection result obtained by the detector.

An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• a substrate stage which has a substrate holder for holding the substrate and which is movable while holding the substrate on the substrate holder;
• a liquid supply mechanism which supplies the liquid;
• a detector which detects whether or not the substrate or a dummy substrate is held by the substrate holder;
• and
• a control unit which controls operation of the liquid supply mechanism on the basis of a detection result obtained by the detector.

An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• a substrate stage which has a substrate holder for holding the substrate and which is movable while holding the substrate on the substrate holder;
• and
• a liquid supply mechanism which supplies the liquid onto the substrate stage only when the substrate or a dummy substrate is held on the substrate holder.

An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• a substrate stage which is movable while holding the substrate;
• and
• a liquid immersion mechanism which forms a liquid immersion area on the substrate stage only when the substrate or a dummy substrate is held by the substrate stage.

An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• and
• a substrate stage which has a recess for holding the substrate and a flat portion arranged around the recess, the flat portion being substantially flush with a surface of the substrate held by the recess, wherein:
• an object is arranged in the recess on the substrate stage, and a liquid immersion area is formed on the substrate stage only when a surface of the object is substantially flush with the flat portion.

An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• a stage which is movable on an image plane side of the projection optical system;
• a first detecting system which detects an alignment mark on the substrate and which detects a reference provided on the stage;
• and
• a second detecting system which detects the reference provided on the stage via the projection optical system, wherein:
• the reference provided on the stage is detected not through the liquid by using the first detecting system, and the reference provided on the stage is detected via the projection optical system and the liquid by using the second detecting system to determine a positional relationship between a detection reference position of the first detecting system and a projection position of the image of the pattern.

An exposure method for exposing a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid, the exposure method comprising:

• detecting position information about an alignment mark on the substrate by using a first detecting system;
• detecting position information about a reference on a substrate stage which holds the substrate, by using the first detecting system;
• and
• detecting the reference on the substrate stage via the projection optical system and the liquid by using a second detecting system after completion of both of detection of the position information about the alignment mark and detection of the position information about the reference on the substrate stage by the first detecting system, wherein:
• a relationship between a detection reference position of the first detecting system and a projection position of the image of the pattern is determined on the basis of a detection result of the position information about the alignment mark obtained by the first detecting system, a detection result of the position information about the reference on the substrate stage obtained by the first detecting system, and a detection result of the position information about the reference on the substrate stage obtained by the second detecting system, and the image of the pattern and the substrate are subjected to positional adjustment to successively project the image of the pattern onto each of a plurality of shot areas on the substrate to expose the substrate.

An exposure method for exposing a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure method comprising:

• detecting an alignment mark on the substrate held by a substrate stage provided with a reference and a substrate holder, by using a first detector;
• detecting the reference through the liquid by using a second detector in a state in which the substrate or a dummy substrate is arranged on the substrate holder;
• and
• performing positional adjustment for the substrate and the image of the pattern on the basis of detection results obtained by the first and second detectors to expose the substrate with the image of the pattern.