# US 2006/0186356 A1 · Extreme ultra violet light source device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2006/0186356 A1 - Document ID: US20060186356A1 - Status: Published application - Kind: A1 - Application number: 11/214,819 - Filed: 2005-08-31 - Published: 2006-08-24 - Earliest claimed: 2004-09-09 - Assignees: Komatsu Ltd.; Gigaphoton Inc. - Inventors: Yousuke Imai; Hideo Hoshino; Hiroshi Komori - Web page: https://patentgrep.com/patent/US20060186356A1 ## CPC - H05G 2/0094: {Reduction, prevention or protection from contamination; Cleaning} - B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic - G03F 7/70033: {by plasma extreme ultraviolet [EUV] sources} - G03F 7/70916: {Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps} - H05G: X-RAY TECHNIQUE (investigating or analysing materials by the use of X-rays G01N23/00; apparatus for X-ray photography G03B42/02; X-ray tubes H01J35/00; TV systems having X-ray input H04N5/321) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract An EUV light source device for protecting a collection mirror from debris that is considered harmful to a mirror coating. The EUV light source device includes: a chamber in which extreme ultra violet light is generated; a target injection unit and a target injection nozzle that supply the chamber with a material to become the target; a laser light source that applies a laser beam to the target so as to generate plasma; a collection mirror that collects the extreme ultra violet light emitted from the plasma; an X-ray source that ionizes neutral particles included in particles emitted from the plasma into charged particles; and plural magnets that generate a magnetic field within the chamber so as to trap at least the charged particles ionized by the X-ray source. ## Claims ### Claim 1 An extreme ultra violet light source device for generating extreme ultra violet light by irradiating a laser beam to a target, said device comprising: a chamber in which extreme ultra violet light is generated; a target supplier that supplies said chamber with a material to become said target; a laser light source that irradiates a laser beam to said target so as to generate plasma; a collection optical system that collects the extreme ultra violet light emitted from the plasma; an ionizer that ionizes neutral particles included in particles emitted from the plasma into charged particles; and a magnetic field generator that generates a magnetic field within said chamber so as to trap at least the charged particles ionized by said ionizer. ### Claim 2 (depends on 1) The extreme ultra violet light source device according to claim 1, further comprising: a collector that collects at least the charged particles trapped by the magnetic field and ejects the charged particles to the outside of said chamber. ### Claim 3 (depends on 1) The extreme ultra violet light source device according to claim 1, wherein said ionizer includes an X-ray applier that applies an X-ray toward the neutral particles. ### Claim 4 (depends on 1) The extreme ultra violet light source device according to claim 1, wherein said ionizer includes an electron gun that emits an electron toward the neutral particles. ### Claim 5 (depends on 1) The extreme ultra violet light source device according to claim 1, wherein said ionizer includes a plasma generator that generates second plasma to collide with the neutral particles. ### Claim 6 (depends on 5) The extreme ultra violet light source device according to claim 5, wherein said plasma generator includes a microwave waveguide. ### Claim 7 (depends on 5) The extreme ultra violet light source device according to claim 5, wherein said plasma generator includes a high-frequency power supply and an antenna for helicon wave excitation connected to said high-frequency power supply. ### Claim 8 (depends on 5) The extreme ultra violet light source device according to claim 5, wherein said plasma generator includes a high-frequency power supply and an antenna connected to said high-frequency power supply, and generates inductively coupled plasma. ### Claim 9 (depends on 5) The extreme ultra violet light source device according to claim 5, wherein said plasma generator includes a gyrotron that generates electromagnetic waves to be entered into said chamber. ### Claim 10 (depends on 1) The extreme ultra violet light source device according to claim 1, wherein said ionizer includes a reflection mirror that reflects a wavelength component, which can ionize the neutral particles emitted from the plasma among plural wavelength components contained in the extreme ultra violet light emitted from the plasma, toward the plasma. ### Claim 11 (depends on 10) The extreme ultra violet light source device according to claim 10, wherein said reflection mirror reflects a component having a wavelength not larger than 90 nm in the case where said target is xenon. ### Claim 12 (depends on 1) The extreme ultra violet light source device according to claim 1, further comprising: a shielding gas introducer that introduces a gas for shielding at least between the plasma and said collection optical system.