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US 2006/0186086 A1Published application
Composition for forming a polymer layer and method of forming a pattern using the same
OwnerMyungsun Kim, Sangwoong Yoon +3inventors
InventorsMyungsun Kim, Sangwoong Yoon, Tae-Young Kim, Young-Ho Kim, Seok-Bong Park
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Abstract
A composition for forming a polymer layer and a method of forming a pattern using the same are provided. The composition comprises a polyhydroxystyrene resin, a cross-linking compound including silicon and a solvent. The composition has an organic-inorganic hybrid system. Thus, a polymer layer formed using the composition has improved etching resistance with respect to a photoresist pattern in an etching process.
Claims18
A composition for forming a polymer layer comprising:
- a polyhydroxystyrene resin;
- a cross-linking compound including silicon;
- and
- a solvent.
1 more element
A method of forming a pattern comprising:
- forming a polymer layer on an object by coating thereon a composition including a polyhydroxystyrene resin, a cross-linking compound including silicon and a solvent;
- forming a photoresist pattern on the polymer layer;
- forming a polymer layer pattern by etching an exposed polymer layer through the photoresist pattern;
- and
- etching an exposed object using the polymer layer pattern as a mask.
2 more elements
Dependencies are inferred from the claim text.