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AssigneeASML Netherlands B.V.
InventorsMartinus Verhagen, Roelof De Graaf, Johannes Henricus Jacobs, Hans Jansen, Marco Stavenga, Jacobus Johannus Leonardus Verspay
Estimating the term…
A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
A method for filtering a fluid and determining a purity of the filtered fluid, comprising:
A device manufacturing method, comprising:
An ultra pure water having a known purity, the water having been filtered by:
A lithographic projection system arranged to project a pattern from a patterning device onto a substrate via a liquid, comprising a filtration system configured to filter the liquid and having:
Dependencies are inferred from the claim text.