Method and apparatus for cleaning articles used in the production of semiconductors
AssigneeDynamic Microsystems Semiconductor Equipment GmbH
InventorsThomas Moran, Lutz Rebstock
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Abstract
An apparatus and a method serve for cleaning articles used in the production of semiconductors, such as wafers, containers for transporting wafers (known as FOUPs), LCD substrates and photomasks. The articles are cleaned in a treatment chamber by means of a liquid and subsequently dried. A drying gas, such as air, is circulated within the treatment chamber and a condensation dryer is provided for extracting moisture from the gas.
Claims25
An apparatus for cleaning articles selected from a group containing semiconductor wafers, containers for transporting semiconductor wafers, LCD substrates and photomasks, comprising:
- a closed treatment chamber adapted to accommodate the articles while they are cleaned, and adapted to accommodate a gaseous medium,
- a rotor being arranged in the treatment chamber for rotatably holding the articles while they are cleaned,
- at least one spray nozzle arranged in the treatment chamber for spraying a cleaning or rinsing liquid onto the articles,
- a condensation dryer arranged in the treatment chamber for drying the articles, the condensation dryer being adapted to condense moisture contained in the gaseous medium while it is circulated in the treatment chamber, and
- a spray-protection wall arranged between the rotor and the condensation dryer in order to prevent cleaning or rinsing liquid from being splashed against the condensation dryer.
An apparatus for cleaning articles used in the production of semiconductors, having a treatment chamber in which the articles are cleaned by means of a liquid and subsequently dried, having an arrangement for moving a gas within the treatment chamber when it is closed, and having a condensation dryer connected to the treatment chamber, wherein the arrangement is adapted to circulate the gas within the closed treatment chamber to the condensation dryer.
A method for cleaning articles used in the production of semiconductors, wherein the articles are cleaned in a treatment chamber by means of a liquid and subsequently dried, a gas being circulated within the treatment chamber, with the treatment chamber being closed, and the gas being dried by means of a condensation dryer.
Dependencies are inferred from the claim text.