Method for manufacturing a film bulk acoustic resonator
AssigneeKabushiki Kaisha Toshiba
InventorYoshihisa Kawamura
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Abstract
A method for manufacturing a film bulk acoustic resonator includes forming a closed room in a supporting substrate; forming a bottom electrode above the closed room, the bottom electrode provided on a surface of the supporting substrate; forming a piezoelectric film on a surface of the bottom electrode; forming a top electrode facing the bottom electrode to sandwich the piezoelectric film; forming an opening connected to the closed room from the surface of the supporting substrate; and forming a cavity by removing a portion of the supporting substrate under the bottom electrode through the opening and the closed room.
Claims15
A method for manufacturing a film bulk acoustic resonator, comprising:
- forming a closed room in a supporting substrate;
- forming a bottom electrode above the closed room, the bottom electrode provided on a surface of the supporting substrate;
- forming a piezoelectric film on a surface of the bottom electrode;
- forming a top electrode facing the bottom electrode so as to sandwich the piezoelectric film between the top electrode and the bottom electrode;
- forming an opening connected to the closed room from the surface of the supporting substrate;
- and
- forming a cavity by removing a portion of the supporting substrate under the bottom electrode through the opening and the closed room.
Dependencies are inferred from the claim text.