System and method for fault indication on a substrate in maskless applications
AssigneeASML Netherlands B.V.
InventorMartinus Hoeks
Life of this patent
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Abstract
A method and system for fault indication on a substrate. A method of the present invention includes the following steps. It is determined whether data includes at least one suspicious bit. A pattern generator is controlled with the data. A beam of radiation is patterned using the pattern generator. Features in the patterned beam of radiation are projected onto a target portion of a substrate. One or more markers in the patterned beam are projected onto the substrate indicating the target portions that correspond with the at least one suspicious bit.
Claims16
A method for indicating fault on a substrate, comprising:
- (a) determining whether data includes at least one suspicious bit;
- (b) controlling a pattern generator with the data;
- (c) patterning a beam of radiation using the pattern generator;
- (d) projecting features in the patterned beam of radiation onto a target portion of a substrate;
- and
- (e) projecting one or more markers in the patterned beam onto the substrate indicating the target portions that correspond with the at least one suspicious bit as determined in step (a).
A system, comprising:
- a control module that detects whether data includes at least one suspicious bit and generates suspicious bit information;
- a pattern generator that patterns a beam of radiation, wherein the data and the suspicious bit information are used to control the pattern generator;
- and
- a projection system that projects the patterned beam of radiation, including one or more markers associated with the suspicious bit information, onto a target portion of a substrate.
A system, comprising:
- a control module that detects whether data includes at least one suspicious bit and generates suspicious bit information;
- a pattern generator that patterns a beam of radiation, wherein the data and the suspicious bit information are used to control the pattern generator;
- and
- a projection system that projects the patterned beam of radiation onto a target portion of a substrate;
- a memory that stores the data and any suspicious bit information relating to the at least one suspicious bit;
- and
- a rasterizer that sends the data and any suspicious bit information to the pattern generator.
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A system, comprising:
- an input device for inputting an error criterion;
- a detector that compares the error criterion to data to determine if at least one suspicious bit exists in the data;
- a pattern generator that patterns a beam of radiation, wherein the data and the suspicious bit information are used to control the pattern generator;
- and
- a projection system that projects the patterned beam of radiation onto a target portion of a substrate.
Dependencies are inferred from the claim text.