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US 2006/0141802 A1Published application
Silicon electrode assembly surface decontamination by acidic solution
AssigneeLam Research Corporation
InventorsHong Shih, Tuochuan Huang, Chunhong Zhou
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Abstract
Methods for cleaning silicon surfaces of electrode assemblies by efficiently removing contaminants from the silicon surfaces without discoloring the silicon surfaces using an acidic solution comprising hydrofluoric acid, nitric acid, acetic acid, and balance deionized water.
Claims26
A method of cleaning a used electrode assembly comprising a plasma-exposed silicon surface, the method comprising contacting the silicon surface with an acidic cleaning solution comprising:
- hydrofluoric acid;
- nitric acid;
- acetic acid;
- and
- balance deionized water;
- and
- wherein contaminants are removed from the silicon surface;
- and
- further wherein the silicon surface is not discolored.
6 more elements
Dependencies are inferred from the claim text.