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US 2006/0141393 A1Published application
Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel
AssigneeSamsung Electronics Co., Ltd.
InventorsHi-Kuk Lee, Yako Yuko, Kyu-Young Kim
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Abstract
A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The surfactant includes an organic fluorine compound having the structure a first silicone compound having the structure a second silicone compound having the structure The resin composition may be used in display panels.
Claims20
A photosensitive resin composition comprising:
- an alkali-soluble resin;
- a quinone diazide;
- a solvent;
- and
- a surfactant that includes:
- an organic fluorine compound of structure
- where Rf is a chained or branched perfluoroalkylene group including about 5-10 carbon atoms and Z is a hydrogen or a fluorine;
- a first silicone compound of structure
- where R is a chained or branched alkylene group including about 2-5 carbon atoms and each of x and y is an integer of about 1-20;
- and
- a second silicone compound of structure
- where R′ is an alkyl group including about 1-20 carbon atoms or a chained or branched carbonyl alkyl group including about 2-21 carbon atoms and each of v and w is an integer of about 1-20, and each of m and l is an integer of about 1-9 wherein (m+l) lies between 2 and 10.
9 more elements
A thin film panel comprising:
- a substrate;
- a thin film pattern formed on the substrate;
- and
- an insulating layer formed on the thin film pattern and made from a photosensitive resin composition including an alkali-soluble resin, a quinone diazide, a solvent, and a surfactant that comprises:
- an organic fluorine compound of structure
- where Rf is a chained or branched perfluoroalkylene group including about 5-10 carbon atoms and Z is a hydrogen or a fluorine;
- a first silicone compound of structure
- where R is a chained or branched alkylene group including about 2-5 carbon atoms and each of x and y is an integer of about 1-20;
- and
- a second silicone compound of structure
- where R′ is an alkyl group including about 1-20 carbon atoms or a chained or branched carbonyl alkyl group including about 2-21 carbon atoms and each of v and w is an integer of about 1-20, and each of m and l is an integer of about 1-9 wherein (m+l) lies between 2 and 10.
8 more elements
A method of manufacturing a thin film panel, the method comprising:
- forming a thin film pattern on a substrate;
- coating a photosensitive resin composition including an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent;
- performing a light exposure on the photosensitive resin composition through a photomask;
- and
- developing the photosensitive resin composition to obtain a thin film pattern, wherein the surfactant comprises:
- an organic fluorine compound of structure
- where Rf is a chained or branched perfluoroalkylene group including about 5-10 carbon atoms and Z is a hydrogen or a fluorine;
- a first silicone compound of structure
- where R is a chained or branched alkylene group including about 2-5 carbon atoms and each of x and y is an integer of about 1-20;
- and
- a second silicone compound of structure
- where R′ is an alkyl group including about 1-20 carbon atoms or a chained or branched carbonyl alkyl group including about 2-21 carbon atoms and each of v and w is an integer of about 1-20, and each of m and l is an integer of about 1-9 wherein (m+l) lies between 2 and 10.
9 more elements
Dependencies are inferred from the claim text.