Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions

A sulfonium salt compound shown by the following formula (1),

• wherein R1 represents a linear or branched alkyl group having 1-14 carbon atoms, a monovalent hydrocarbon group having an alicyclic skeleton and containing 3-14 carbon atoms, a linear or branched alkoxyl group having 1-14 carbon atoms, a group represented by —OR3 (wherein R3 is a monovalent hydrocarbon group having an alicyclic skeleton and containing 3-14 carbon atoms), a linear or branched alkyl sulfanyl group having 1-14 carbon atoms, an organic sulfanyl group having an alicyclic skeleton and containing 3-14 carbon atoms, a linear or branched alkane sulfonyl group having 1-14 carbon atoms, or an organic sulfonyl group having an alicyclic skeleton and containing 3-14 carbon atoms, two or more R1 being either the same or different, R2 represents a substituted or unsubstituted, linear, branched, or cyclic alkyl group having 1-14 carbon atoms, or two or more R2 groups bond to form a monocyclic structure having 3-14 carbon atoms or a polycyclic structure having 6-14 carbon atoms, two or more R2 groups being either the same or different, p is an integer of 0-7, q is an integer of 0-6, n is an integer of 0-3, and X− represents a sulfonic acid anion.