A tilting device for providing a projection beam with a tilt for use in an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a patterning device that is provided with a pattern, the patterning device serving to impart the projection beam with a patterned cross-section, a table for holding a target object, and a projection system for projecting the patterned beam onto the target object, the tilting device being provided substantially in a pupil plane of the projection system and comprising:
- a pattern comprising a first portion configured to generate a first set of positive and negative diffraction orders and a second portion configured to generate a second set of positive and negative diffraction orders, wherein the tilting device is further configured to block the first set of positive diffraction orders and the second set of negative diffraction orders.