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US 2006/0141370 A1Published application
Photomasks and methods of manufacturing the same
OwnerSuk-Pil Kim, I-Hun Song +3inventors
InventorsSuk-Pil Kim, I-Hun Song, Won-Joo Kim, Seung-Hyuk Chang, Hoon Kim
Life of this patent
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Abstract
A photomask may include a reflection layer including a material capable of reflecting electromagnetic radiation, and at least one ion region. The ion region may be formed by implanting ions of an absorbent capable of absorbing electromagnetic radiation. The reflection layer may have a stack structure including a plurality of layers. The ions of the dopant may be implanted into at least one of the plurality of layers.
Claims23
A photomask comprising:
- a substrate;
- a reflection layer formed on the substrate, and including a material capable of reflecting electromagnetic radiation;
- and
- at least one ion region formed within the reflection layer capable of absorbing the electromagnetic radiation.
1 more element
A method of manufacturing a photomask, the method comprising:
- forming a reflection layer on a substrate, the reflection layer including a material capable of reflecting electromagnetic radiation;
- and
- forming at least one ion region within at least a portion of the reflection layer, the ion region being capable of absorbing the electromagnetic radiation.
Dependencies are inferred from the claim text.