Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film

A metal film formed by a thin film forming method comprising the steps of holding a substrate, over the surface of which a thin film made of a metal is to be formed, in a chamber;

• supplying a gas for generating plasma into the chamber;
• applying high frequency electric field in the inner space of the chamber;
• heating and evaporating an evaporation material that is the material of the thin film, in the chamber;
• and controlling the gas supply wherein the quantity of the gas supplied into the chamber for generating plasma is controlled so as to be larger in the early stage of the thin film forming process than in the latter stage, wherein the substrate is maintained at a temperature not higher than 80° C. when the thin film is formed.

A metal oxide film formed by a thin film forming method comprising the steps of holding the substrate over the surface of which a thin film made of a metal oxide is to be formed in a chamber;

• supplying a gas for generating plasma and oxygen gas into the chamber;
• applying high frequency electric field in the inner space of the chamber;
• heating and evaporating an evaporation material that is the material of the thin film in the chamber;
• and controlling the gas supply wherein the quantity of gas supplied into the chamber for generating plasma is controlled so as to be larger in the early stage of the thin film forming process than in the latter stage, while the substrate is maintained at a temperature of 60° C. or lower throughout the period when the thin film is formed.