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US 2006/0141222 A1Published application
Introducing nanotubes in trenches and structures formed thereby
AssigneeIntel Corporation
InventorsPaul Fischer, Anne Miller, Kenneth Cadien, Chris Barns
Life of this patent
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Abstract
Methods of forming a microelectronic structure are described. Embodiments of those methods include providing a substrate comprising at least one opening, and then applying a nanotube slurry comprising at least one nanotube to the substrate, wherein the at least one nanotube is substantially placed within the at least one opening.
Claims38
A method of forming a structure comprising:
- providing a substrate comprising at least one opening;
- and
- applying a nanotube slurry comprising at least one nanotube to the substrate, wherein the at least one nanotube is substantially placed within the at least one opening.
A method comprising:
- providing a substrate comprising at least one opening and a top surface, wherein the top surface comprises a first charge state, and a bottom surface and a sidewall of the at least one opening comprises a second charge state, wherein the first charge state and the second charge state are opposite in sign;
- and
- applying a nanotube slurry comprising at least one nanotube to the substrate, wherein the at least one nanotube comprises the first charge state, and wherein the at least one nanotube is substantially placed within the at least one opening by electrostatic attraction.
A method comprising:
- providing a substrate comprising at least one opening;
- and
- applying a nanotube slurry comprising at least one nanotube to the substrate, wherein the at least one nanotube is substantially placed within the at least one opening by applying a vibrational frequency to the substrate.
A method comprising:
- providing a substrate comprising at least one opening;
- and
- applying a nanotube slurry comprising at least one nanotube to the substrate, wherein the at least one nanotube is substantially placed within the at least one opening by applying a first electric field substantially parallel to a length of the at least one opening and a second electric field perpendicular to a top surface of the substrate.
A method comprising:
- providing a substrate comprising at least one opening;
- applying a nanotube slurry comprising a plurality of nanotubes to the substrate, wherein a first portion of the plurality of nanotubes is placed on a top surface of the substrate, and a second portion of the plurality of nanotubes is substantially placed within the at least one opening;
- and
- substantially removing the first portion by applying a fluid to the substrate.
1 more element
A method comprising:
- providing a substrate comprising at least one opening;
- applying a nanotube slurry to the substrate, wherein the nanotube slurry comprises a liquid portion and a portion comprising at least one nanotube;
- and
- substantially placing the at least one nanotube within the at least one opening by substantially evaporating the liquid portion.
1 more element
A structure comprising:
- a substrate comprising at least one opening;
- and
- at least one nanotube substantially disposed within the at least one opening, wherein a length of the at least one nanotube is oriented substantially parallel with a length of the at least one opening.
Dependencies are inferred from the claim text.