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US 2006/0140624 A1Published application
Method of developing a resist film and a resist development processor
AssigneeHitachi Science Systems, Ltd.
InventorsHisayuki Takasu, Kouichi Miyazawa, Toru Iwaya
Life of this patent
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Abstract
The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
Claims8
(canceled)
A resist development processor comprising:
- a high pressure gas container for storing a high pressure gas of said development solvent, said high pressure gas container being connected to said development processing chamber through a valve;
- and
- a liquid container for storing said development solvent, said liquid container being connected through a valve.
4-5. (canceled)
(canceled)
9-16. (canceled)
Dependencies are inferred from the claim text.