Method and apparatus for creating a phase step in mirrors used in spatial light modulator arrays
AssigneeASML Holding N.V.
InventorSteven Roux
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Abstract
A method and apparatus for patterning an array of SLM mirrors with a phase step is disclosed. Additional embodiments of the present invention describe a method for processing a substrate, wherein the processed substrate is used in the apparatus for patterning an array of SLM mirrors with a phase step. The processed substrate is then placed in close proximity to the mirrors and the etching/deposition process is then done through openings in the substrate. In embodiments in which the processed substrate does not have a high enough density of openings, a stepping and repeating process is used in order to achieve complete process coverage of every mirror in an array of SLM mirrors.
Claims22
A method, comprising:
- (a) creating a plurality of cavities on a first major side of a wafer;
- (b) patterning a second major side of the wafer with an etch-resistant layer;
- and
- (c) etching portions of the wafer not patterned with the etch-resist layer to create openings between the first major side and the second major side of the wafer.
An apparatus, comprising:
- a material source that directs material towards an array of mirrors, each mirror having an area;
- and
- a mask that blocks at least a portion of the material from reaching the array of mirrors, such that the material only impinges upon a predetermined portion of the respective areas of given mirrors in the array.
Dependencies are inferred from the claim text.