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US 2006/0139660 A1Published application
Lithographic apparatus, device manufacturing method and device manufactured thereby
AssigneeAsmil Netherlands B.V.
InventorYim Patrick Kwan
Life of this patent
Estimating the term…
Abstract
The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.
Claims17
A lithographic projection apparatus comprising:
- a support structure for supporting a patterning device, the patterning device serving to pattern a beam of radiation according to a desired pattern;
- a substrate table for holding a substrate;
- a projection system for projecting the patterned beam onto a target portion of the substrate;
- and
- a displacement measuring system for measuring a position of a moveable object comprising one of the support structure and the substrate table, wherein the displacement measuring system comprises an encoder system for measuring two degrees of freedom of the moveable object relative to a reference frame, and wherein the displacement measurement system also comprises a Z-sensor for measuring at least another degree of freedom of the moveable object relative to the reference frame.
2 more elements
A lithographic projection apparatus comprising:
- a support structure for supporting a patterning device, the patterning device serving to pattern a beam of radiation according to a desired pattern;
- a substrate table for holding a substrate;
- a projection system for projecting the patterned beam onto a target portion of the substrate;
- a reference frame comprising a lens frame including a lens of the projection system and a measurement frame,
- an encoder system for measuring displacements between the measurement frame and the lens frame;
- and
- a displacement measuring system for measuring a position of a moveable object comprising one of the support structure and the substrate table with respect to the measurement frame, such that the position of the moveable object relative to the lens frame can be determined.
4 more elements
Dependencies are inferred from the claim text.