Lithographic apparatus and actuator

A lithographic apparatus comprising:

• an illumination system configured to condition a beam of radiation;
• a patterning device support configured to support a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation;
• a substrate support configured to hold a substrate;
• a projection system configured to project the patterned beam of radiation onto a target portion of the substrate;
• an electromagnetic actuator configured to actuate a part of the lithographic apparatus, the actuator having a substantially stationary part and a movable part interacting with each other, the stationary part comprising a plurality of coils and a magnetic circuit of magnetizable material, and the movable part comprising a magnet system;
• the magnet system comprising an array of magnets forming a magnet array having opposite ends, each magnet of the magnet array having a direction of polarization, the magnet array comprising an array of primary magnets, a direction of polarization of an end primary magnet at an end position of the array of primary magnets differing from a direction of polarization of an intermediate primary magnet, the intermediate primary magnet being arranged at an intermediate position between the end primary magnet and another end primary magnet disposed at another end position of the array of primary magnets.