Lithographic apparatus and device manufacturing method utilizing a substrate handler
AssigneeASML Netherlands B.V.
InventorsHernes Jacobs, Harmen Van Der Schoot, Petrus Vosters, Bernardus Luttikhuis
Life of this patent
Estimating the term…
Abstract
A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.
Claims45
A substrate handler, comprising:
- at least one support surface that carry a plurality of independent substrates simultaneously,
- wherein the substrate handler moves each respective one of the plurality of independent substrates relative to a substrate table of a lithographic apparatus,
- wherein the substrate handler moves substrates to and from the substrate table before and after exposure.
A substrate handler, comprising:
- a support surface that carries a substrate;
- and
- a pre-conditioning unit that pre-conditions the substrate,
- wherein the substrate handler moves the substrate relative to a substrate table.
A lithographic apparatus, comprising:
- a base plate;
- a substrate table that supports a substrate, the substrate table being supported by the base plate;
- a patterning system that applies a pattern to a target portion of the substrate, and
- a substrate handler that moves the substrate relative to the substrate table, the substrate handler being positioned substantially over the base plate.
A method of manipulating substrates in a lithographic apparatus comprising a substrate table, a patterning system, and a substrate handler adapted to carry a plurality of substrates simultaneously, the method comprising:
- (a) placing an unexposed substrate onto a first support surface of the substrate handler;
- (b) moving the substrate handler so that the first support surface is substantially aligned in a horizontal plane with the substrate table;
- (c) loading the unexposed substrate directly from the first support surface of the substrate handler onto the substrate table;
- (d) applying a pattern to the substrate using the patterning system;
- (e) unloading the exposed substrate from the substrate table onto a second support surface of the substrate handler;
- and
- (f) removing the exposed substrate from the second support surface of the substrate handler.
A device manufacturing method, comprising:
- (a) providing a substrate on a substrate table;
- (b) applying a pattern onto a target portion of the substrate;
- and
- (c) moving a substrate relative to the substrate table using a substrate handler comprising a pre-conditioning unit.
A device manufacturing method, comprising:
- (i) providing a substrate on a substrate table supported by a base plate;
- (ii) applying a pattern onto a target portion of the substrate;
- and
- (iii) moving a substrate relative to the substrate table using a substrate handler, the substrate handler being positioned substantially over the base plate.
A lithographic apparatus, comprising:
- a substrate table that supports a substrate, the substrate table being supported on a base plate and traveling therealong during a scanning operation between a start position and an end position;
- a patterning system that applies a pattern to a target portion of the substrate, and
- a substrate handler that moves the substrate relative to the substrate table, the substrate handler comprising,
- a loading platform disposed on one side of the substrate table above the base plate, and
- an unloading platform disposed on an opposite side of the substrate table and to one side of the base plate, at least the loading platform being vertically movable between a raised position above the substrate table and a lowered position in which it is substantially aligned in a horizontal plane with the substrate table,
- wherein the loading platform loads the substrate onto the table when in the lowered position and receiving the substrate from the substrate table when it is at an end position after the scanning operation,
- wherein both the loading and the unloading platform are level with the substrate table when it is at the end position so that loading and unloading can be performed substantially simultaneously.
A substrate handler adapted for use in lithographic apparatus, the apparatus comprising:
- a substrate table that supports a substrate during exposure to a beam of radiation;
- and
- a plurality of platforms each adapted to carry at least one of the substrates,
- wherein the substrate handler loads the at least one substrate onto and unloads the at least one substrate from the substrate table before and after exposure.
Dependencies are inferred from the claim text.