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AssigneeASML Netherlands B.V.
InventorsMaurice Mee, Edwin Buis, Johannes Adrianus Antonius Dams, Johannes Andreas Henricus Jacobs, Antoine Verweij, Erik Rekkers
Estimating the term…
A lithographic apparatus includes a guiding mechanism to guide a movable structure such as a mask blade of a reticle masking device, a movable part connected to the movable structure, and a substantially stationary part to guide the movable part. The movable part includes a nozzle to inject a gas in a gap between the movable and stationary parts, a contactless supply of the gas from the stationary part to the movable part being provided by a gas supply outlet in the stationary part and a gas supply inlet in the movable part. The gas supply outlet includes an inlet trench in a surface of the movable part facing the gas supply outlet of the stationary part, the trench being orientated parallel to a direction of movement of the movable part. The movable part includes a motor drive part and a counter weight part connected to an end of the motor drive part facing away from the movable structure.
A guiding mechanism for use in a lithographic mechanism, said guiding mechanism configured to guide a movable structure and comprising:
A reticle masking device for use in a lithographic apparatus, the device comprising:
A gas bearing configured to bear a movable part with respect to a substantially stationary part, said gas bearing comprising:
A lithographic apparatus comprising:
Dependencies are inferred from the claim text.