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AssigneeNikon Corporation
InventorsSoichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
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In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.
An exposure method comprising:
An exposure method comprising:
A substrate stage used in a liquid immersion exposure in which a substrate is exposed by projecting an image of a pattern onto said substrate via a projection optical system and a liquid, comprising:
A substrate stage used in a liquid immersion exposure in which a substrate is exposed by forming a liquid immersion region on a part of the substrate and by projecting an image of a pattern onto said substrate via a projection optical system and a liquid, comprising:
A substrate stage comprising:
A substrate stage that is movable while holding a substrate as an object to be exposed, the substrate stage comprising:
A substrate stage comprising:
A substrate stage comprising:
Dependencies are inferred from the claim text.