Polarized radiation in lithographic apparatus and device manufacturing method
AssigneesASML Netherlands B.V., Carl Zeis SMT AG
InventorsChristian Wagner, Wilhelmus De Boeij, Roel De Jonge, Tilmann Heil, Damian Fiolka
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Abstract
A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
Claims30
A lithographic apparatus, comprising:
- an illumination system configured to condition a radiation beam;
- a support constructed to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table constructed to hold a substrate;
- and
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus comprises an optical active element, the optical element being configured to selectively provide a first portion of the radiation beam with a linear polarization in the first direction, or to provide a first portion of the radiation beam with a linear polarization in the first direction and provide a second portion of the radiation beam with a linear polarization in a second direction, the second direction being perpendicular to the first direction.
A lithographic apparatus comprising an optical active element, the optical active element being configured to selectively provide a first portion of the radiation beam with a linear polarization in the first direction, or to provide a first portion of the radiation beam with a linear polarization in the first direction and provide a second portion of the radiation beam with a linear polarization in a second direction, the second direction being substantially perpendicular to the first direction.
A device manufacturing method, comprising:
- selectively providing a first portion of a radiation beam with a linear polarization in a first direction, or providing a first portion of a radiation beam with a linear polarization in a first direction and providing a second portion of the radiation beam with a linear polarization in a second direction, the second direction being substantially perpendicular to the first direction.
- imparting a pattern to the radiation beam;
- and
- projecting the patterned beam of radiation onto a target portion of a substrate.
A device manufactured by a device manufacturing method, the device manufacturing method comprising:
- selectively providing a first portion of a radiation beam with a linear polarization in a first direction, or providing a first portion of a radiation beam with a linear polarization in a first direction and providing a second portion of the radiation beam with a linear polarization in a second direction, the second direction being substantially perpendicular to the first direction.
- imparting a pattern to the radiation beam;
- and
- projecting the patterned beam of radiation onto a target portion of the substrate.
Dependencies are inferred from the claim text.