De-focus uniformity correction
AssigneeASML Holding N.V.
InventorsRoberto Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
Life of this patent
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AssigneeASML Holding N.V.
InventorsRoberto Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
Estimating the term…
A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.
For use in connection with a lithography tool, a method for calculating an intensity integral, comprising:
A method for calculating an intensity integral modified by a plurality of adjustable components of a uniformity correction system, comprising:
A method for de-focus uniformity correction for use in a system having a uniformity correction system and a correction module, wherein the uniformity correction system has an adjustable component, comprising:
Dependencies are inferred from the claim text.