Scanner apparatus with twin substrate stage, semiconductor photo equipment with the apparatus and method of manufacturing a semiconductor device using the equipment

A semiconductor photo equipment comprising:

• a spinner apparatus and a scanner apparatus arranged inline, wherein the scanner apparatus includes:
• an exposure unit having an exposure substrate stage and an alignment unit having an alignment substrate stage, wherein the alignment unit includes:
• an aligning/leveling apparatus for performing global aligning and leveling processes for a wafer installed on the alignment substrate stage;
• and
• an edge exposure apparatus receiving light from a light source and for performing an edge exposure process for the wafer.

A semiconductor manufacturing method using a semiconductor photo equipment having a scanner apparatus and a spinner apparatus arranged to be inline with the scanner apparatus, the scanner apparatus including an alignment unit and an exposure unit, the method comprising:

• performing aligning and leveling processes for a wafer in the alignment unit;
• performing an wafer edge exposure process for the wafer in the alignment unit;
• and
• performing a main exposure process for the wafer in the exposure unit.