Method for manufacturing LCD
AssigneeBoe Hydis Technology Co., Ltd.
InventorJai Ryu
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Abstract
A method for manufacturing an LCD includes the steps of providing a transparent substrate having a thin film transistor and a protective film successively formed thereon, positioning a shadow mask having a number of openings formed thereon to expose parts on which protrusions are to be formed on top of the substrate, forming protrusions by performing a sputtering process on the substrate using the shadow mask in such a manner that sputtering radicals pass through the openings and are selectively deposited on the protective film, removing the shadow mask, and forming a reflection electrode on the substrate including the protrusions.
Claims15
A method for manufacturing an LCD comprising the steps of:
- providing a transparent substrate having a thin film transistor and a protective film successively formed thereon;
- positioning a shadow mask having a number of openings formed thereon to expose parts on which protrusions are to be formed on top of the substrate;
- forming protrusions by performing a sputtering process on the substrate using the shadow mask in such a manner that sputtering radicals pass through the openings and are selectively deposited on the protective film;
- removing the shadow mask;
- and
- forming a reflection electrode on the substrate including the protrusions.
A method for manufacturing an LCD comprising the steps of:
- providing a transparent substrate having a thin film transistor and a protective film successively formed thereon;
- positioning a shadow mask having a number of openings formed thereon to expose parts on which protrusions are to be formed on top of the substrate;
- forming protrusions by performing a sputtering process on the protective film using the shadow mask, while moving any one of the shadow mask and the substrate in a plane, in such a manner that sputtering radicals pass through the openings and are selectively deposited on the protective film;
- removing the shadow mask;
- and
- forming a reflection electrode on the substrate including the protrusions.
A method for manufacturing an LCD comprising the steps of:
- providing a transparent substrate having a thin film transistor and a protective film successively formed thereon;
- positioning a shadow mask having a number of openings formed thereon to expose parts on which protrusions are to be formed on top of the substrate;
- forming protrusions by performing a sputtering process on the substrate using the shadow mask, while vibrating any one of the shadow mask and the substrate in a plane, in such a manner that sputtering radicals pass through the openings and are selectively deposited on the protective film;
- removing the shadow mask;
- and
- forming a reflection electrode on the substrate including the protrusions.
A method for manufacturing an LCD comprising the steps of:
- providing a transparent substrate having a thin film transistor and a protective film successively formed thereon;
- positioning a shadow mask having a number of openings formed thereon to expose parts on which protrusions are to be formed on top of the substrate;
- forming protrusions by performing an oblique deposition process on the substrate using the shadow mask in a deposition direction slanted relative to the substrate in such a manner that sputtering radicals pass through the openings and are selectively deposited on the substrate;
- removing the shadow mask;
- and
- forming a reflection electrode on the substrate including the protrusions.
Dependencies are inferred from the claim text.