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US 2006/0138602 A1Published application
Device manufacturing method, top coat material and substrate
AssigneeASML Netherlands B.V.
InventorsJohannes Mulkens, Marcel Marie Dierichs
Life of this patent
Estimating the term…
Abstract
In immersion lithography, to avoid internal reflections in the final element of the projection system, immersion fluid and topcoat, the thicknesses, dl, dtc and dr, and refractive indices, nl, ntc and nr, of the immersion fluid, topcoat and resist may meet the following criteria: nl≦ntc≦nr dl>˜5.λ dtc≦˜5λ
Claims27
A device manufacturing method, comprising:
- projecting a patterned beam of radiation through a liquid onto a resist provided on a substrate, wherein
- a topcoat layer is provided between the resist and the liquid, the topcoat layer having a thickness that is less than or equal to about five times the wavelength of the radiation of the patterned beam,
- the liquid has a thickness that is greater than or equal to about five times the wavelength of the radiation of the patterned beam, and
- the liquid, the topcoat and the resist have respectively, first, second and third refractive indices, the first refractive index being less than or equal to the second refractive index and the second refractive index being less than or equal to the third refractive index.
1 more element
A device manufacturing method, comprising:
- projecting a patterned beam of radiation through a liquid onto a resist provided on a substrate, wherein
- a topcoat layer is provided between the resist and the liquid, the topcoat has a thickness substantially equal to
- (
- m
- -
- 1
- 2
- )
-
- λ
- 2.
-
- n
- tc
- .
- (
- 1
- -
- sin
- 2
-
- β
- )
- ,
- wherein sin
- β
- =
- NA
- .
- n
- l
- n
- r
- ,
- m=1, 2, 3, etc., λ is the wavelength of the radiation of the patterned beam, NA is the numerical aperture at the substrate, nl is the refractive index of the liquid, ntc is the refractive index of the topcoat, and nr is the refractive index of the resist;
- the liquid has a thickness that is greater than or equal to about five times λ,
- the resist has a thickness in the range of from half to one times λ, and
- nl is less than or equal to ntc, ntc is less than or equal to nr, and ntc is about equal to the square root of the product of nl and nr.
35 more elements
A device manufacturing method, comprising:
- projecting a patterned beam of radiation through a liquid onto a resist provided on a substrate, wherein a topcoat layer is provided between the resist and the liquid, the topcoat comprising a suspension of nano-particles.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation through a liquid onto a resist provided on a substrate, wherein a topcoat layer is provided between the resist and the liquid and a primer layer is provided between the resist and the topcoat, the primer layer having a thickness less than the wavelength of the radiation of the patterned beam.
A substrate, comprising:
- a surface substantially covered by a resist that can be exposed by radiation;
- and
- a topcoat layer substantially covering the resist, the topcoat layer having a thickness less than or equal to about five times the wavelength of the radiation,
- wherein the topcoat and the resist have respectively, first and second refractive indices, the first refractive index being less than or equal to the second refractive index.
1 more element
A substrate, comprising:
- a surface substantially covered by a resist that can be exposed by radiation;
- a topcoat layer substantially covering the resist;
- and
- a primer layer provided between the resist and the topcoat layer, the primer layer having a thickness less than the wavelength of the radiation.
1 more element
Dependencies are inferred from the claim text.