Method for fabricating CMOS image sensor
AssigneeDongbuAnam Semiconductor Inc.
InventorIn Gyun Jeon
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Abstract
A CMOS image sensor and a method for fabricating the same are disclosed, in which transfer characteristics are improved. The method includes forming a photodiode region and a second conductive type ion region on a surface of a first conductive type substrate by implanting a second conductive type impurity ion into an entire surface of the substrate where a transistor is to be formed, forming a second conductive type lightly doped ion region in the substrate corresponding to the photodiode region by lightly implanting a second conductive type impurity ion only in an area where the photodiode region is opened, and diffusing the second conductive type lightly doped ion region into the second conductive type ion region by a thermal process.
Claims19
A method for fabricating a CMOS image sensor comprising:
- forming a photodiode region corresponding to a first source and drain region of a transistor and a second conductive type ion region on a surface of a first conductive type substrate by implanting a second conductive type impurity ion into an entire surface of the substrate where the transistor is to be formed;
- forming a second conductive type lightly doped ion region in the substrate corresponding to the photodiode region by lightly implanting a second conductive type impurity ion only in an area where the photodiode region is opened;
- and
- diffusing the second conductive type lightly doped ion region into the second conductive type ion region by a thermal process.
A CMOS image sensor comprising:
- a first conductive type semiconductor substrate including a transistor region and a photodiode region corresponding to a first source and drain region of a transistor;
- a second conductive type diffusion region formed in the substrate corresponding to the photodiode region, including a second conductive type ion region at an upper portion and a second conductive type lightly doped ion region at a lower portion;
- and
- a first conductive type ion region formed in a surface of the substrate corresponding to the photodiode region.
Dependencies are inferred from the claim text.