Mild methods for generating patterned silicon surfaces
OwnerNed Bowden, Samrat Duttainventors
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Abstract
The invention provides methods for making self-assembling monolayers on silicon surfaces using mild conditions.
Claims40
A layered silicon surface generated by a method that comprises:
- obtaining a silicon surface comprising hydrogen-terminated silicon, and reacting the silicon surface with an anchor molecule in the presence of a sterically hindered free radical source under conditions sufficient to link the anchor molecule to the silicon surface.
A silicon surface linked to hydrogen atoms and an ordered layer of anchor molecules.
A layered silicon surface comprising hydrogen-terminated silicon and at least one ordered monolayer of anchor molecules, wherein the ordered monolayer has a contact angle of at least 100°.
A method comprising obtaining a silicon surface comprising hydrogen-terminated silicon, reacting the silicon surface with an anchor molecule in the presence of a sterically hindered free radical source under conditions sufficient to link the anchor molecule to the silicon surface.
A method comprising obtaining a silicon Si(111)-H surface, reacting the silicon Si(111)-H surface with alkene and diolefin ether anchor molecules in the presence of 2,2,6,6-tetramethyl-1-piperidinyloxy (TEMPO) under conditions sufficient to link the anchor molecules to the silicon Si(111)-H surface.
A compound of the formula:
- R2, R3, R4 and R5 are separately lower alkyl;
- n1 is an integer of 1 to 20;
- n2 is an integer of 1 to 20;
- n3 is an integer of 1 to 20;
- and
- each n4 is separately an integer of 1 to 20.
A compound of the formula:
Dependencies are inferred from the claim text.