Charged particle beam apparatus and contamination removal method therefor
AssigneeHolon Co., Ltd.
InventorsAkira Yonezawa, Tatenori Jinriki, Jun Nitta, Norimichi Anazawa, Ryuichi Shimizu
Life of this patent
Estimating the term…
Loading patent…
AssigneeHolon Co., Ltd.
InventorsAkira Yonezawa, Tatenori Jinriki, Jun Nitta, Norimichi Anazawa, Ryuichi Shimizu
Estimating the term…
A charged particle beam apparatus comprising a preparatory evacuation chamber (15 in FIG. 1A) into which a sample (12) is conveyed and which is preliminarily evacuated, an ultraviolet irradiation unit (21) which is disposed in the preparatory evacuation chamber (15) and which irradiates the surface of the sample (12) conveyed into the preparatory evacuation chamber (15), with ultraviolet rays for a predetermined time period, and a sample chamber (16) into which the sample (12) is conveyed in the preliminarily evacuated state of the preparatory evacuation chamber (15) or from which the sample (12) is conveyed into the preparatory evacuation chamber (15), wherein the ultraviolet irradiation of the sample (12) by the ultraviolet irradiation unit (21) is performed before the conveyance of the sample (12) into the sample chamber (16), or/and after the conveyance thereof from the sample chamber (16), thereby to remove contamination on the surface of the sample (12).
A charged particle beam apparatus wherein an image is generated by irradiating a sample with a charged particle beam and detecting secondary charged particles emitted from the sample, comprising:
A charged particle beam apparatus wherein an image is generated by irradiating a sample with a charged particle beam and detecting secondary charged particles emitted from the sample, comprising:
A charged particle beam apparatus wherein an image is generated by irradiating a sample with a charged particle beam and detecting secondary charged particles emitted from the sample, comprising:
A contamination removal method for a charged particle beam apparatus wherein an image is generated by irradiating a sample with a charged particle beam and detecting secondary charged particles emitted from the sample, comprising:
A contamination removal method for a charged particle beam apparatus wherein an image is generated by irradiating a sample with a charged particle beam and detecting secondary charged particles emitted from the sample, comprising:
A contamination removal method for a charged particle beam apparatus wherein an image is generated by irradiating a sample with a charged particle beam and detecting secondary charged particles emitted from the sample, comprising:
Dependencies are inferred from the claim text.